Patent applications will usually be published 18 months after they have been filed at the patent office. For this reason most documents listed below are older than 18 months.
Michael Patra, Johannes Ruoff
Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable
Filing date: 9 May 2018
Granted: 5 October 2021
China (PRC):
CN112166380A
World Intellectual Property Organisation (WIPO):
WO2019215110A1
Taiwan:
TW202001404A
Germany:
DE102018207277A1
United States of America:
US20210055661A1 US11137688B2
South Korea:
KR102021008374A
European patent office:
EP3791230A1
Michael Patra, Markus Degünther
Illumination apparatus for a projection exposure system
Filing date: 31 July 2014
Granted: 1 June 2021
World Intellectual Property Organisation (WIPO):
WO2016016453A1
Taiwan:
TW201610599A TWI728951B
Germany:
DE102014215088A1 DE102014222884A1
United States of America:
US20170082929A1
Michael Patra
Optical assembly for guiding an output beam of a free electron laser
Filing date: 31 March 2017
Granted: 23 February 2021
China (PRC):
CN110476124A
World Intellectual Property Organisation (WIPO):
WO2018177840A1
Taiwan:
TW201903531A
Germany:
DE102017205548A1
United States of America:
US10928734B2 US20200019064A1
South Korea:
KR102019135014A
Michael Patra
Illumination optic for projection lithography
Filing date: 31 January 2018
Granted: 23 February 2021
World Intellectual Property Organisation (WIPO):
WO2019149462A1
Germany:
DE102018201457A1
China (PRC):
CN111656245A
United States of America:
US10928733B2 US20200348600A1
Michael Patra
Method for the microlithographic production of microstructured components
Filing date: 28 October 2016
Granted: 13 October 2020
World Intellectual Property Organisation (WIPO):
WO2018077594A1
Germany:
DE102016221261A1
United States of America:
US10802403B2 US20190243248A1
Michael Patra
Optical system for a projection exposure apparatus
Filing date: 9 January 2019
Granted: 6 February 2020
China (PRC):
CN111427239A
Taiwan:
TW202026703A
Germany:
DE102019200193B3
Japan:
JP2020112796A
United States of America:
US20200218164A1 US10871717B2
South Korea:
KR102020087090A
European patent office:
EP3680716A1 EP3680716B1
Michael Patra
Projection exposure method and projection exposure apparatus for microlithography
Filing date: 20 September 2016
Granted: 24 December 2019
China (PRC):
CN109891322A
World Intellectual Property Organisation (WIPO):
WO2018054647A1
Germany:
DE102016217929A1
United States of America:
US10514611B2 US20200096877A1 US20190204756A1 US10678144B2
South Korea:
KR102019051041A
European patent office:
EP3516456A1
Michael Patra, Alexander Wolf, Markus Schwab, Toralf Gruner, Joachim Hartjes
Optical component for use in a radiation source module of a projection exposure system
Filing date: 23 December 2014
Granted: 14 May 2019
China (PRC):
CN107111247A
World Intellectual Property Organisation (WIPO):
WO2016102671A1 WO2016102673A1
Taiwan:
TWI687777B TW201629635A TW201626115A TWI701517B
Germany:
DE102014226920A1 DE102014226918A1 DE102014226921A1
United States of America:
US10288894B2 US20170293154A1
South Korea:
KR102017099961A
Markus Degünther, Michael Patra
Facet mirror for an illumination optical unit for projection lithography
Filing date: 25 August 2014
Granted: 26 February 2019
World Intellectual Property Organisation (WIPO):
WO2016030243A1
Taiwan:
TWI676060B TW201614305A
Germany:
DE102014216801A1
China (PRC):
CN106605175A
United States of America:
US20170176865A1 US10216091B2
Michael Patra, Markus Degünther, Paul Büttner, Willi Heintel, Henner Baitinger
Optical component
Filing date: 14 March 2014
Granted: 20 November 2018
World Intellectual Property Organisation (WIPO):
WO2015135966A1
Germany:
DE102014204818A1
United States of America:
US10133183B2 US20160370707A1
Michael Patra
Illumination optical unit for EUV projection lithography
Filing date: 15 May 2012
Granted: 13 November 2018
World Intellectual Property Organisation (WIPO):
WO2013171071A1
Germany:
DE102012208064A1
United States of America:
US20150036115A1 US10126658B2
Markus Degünther, Michael Patra, Thomas Korb
Beam distributing optical device and associated unit, system and apparatus
Filing date: 25 February 2014
Granted: 28 August 2018
World Intellectual Property Organisation (WIPO):
WO2015128288A1
South Korea:
KR102016126034A
Germany:
DE102014203348A1
European patent office:
EP3111269A1 EP3111269B1
United States of America:
US10061203B2 US20160357114A1
Stig Bieling, Martin Endres, Markus Degünther, Michael Patra, Johannes Wangler
Illumination optical unit for EUV projection lithography
Filing date: 25 August 2014
Granted: 10 July 2018
World Intellectual Property Organisation (WIPO):
WO2016030248A1
Germany:
DE102014216802A1
United States of America:
US20170160642A1 US10018917B2
Michael Patra, Markus Degünther
Projection exposure apparatus and method for controlling a projection exposure apparatus
Filing date: 15 June 2012
Granted: 26 June 2018
World Intellectual Property Organisation (WIPO):
WO2013185919A1
South Korea:
KR102015032856A
Germany:
DE102012210071A1
United States of America:
US20150085271A1 US10007193B2
Hans-Jürgen Dobschal, Karsten Lindig, Günter Rudolph, Ersun Kartal, Lisa Riedel, Frank Widulle, Michael Patra
Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens
Filing date: 16 April 2015
Granted: 5 June 2018
World Intellectual Property Organisation (WIPO):
WO2015158829A1
United States of America:
US20170192237A1 US9989767B2
Hans-Jürgen Dobschal, Karsten Lindig, Günter Rudolph, Lisa Riedel, Frank Widulle, Ersun Kartal, Michael Patra
Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens
Filing date: 16 April 2015
Granted: 5 June 2018
World Intellectual Property Organisation (WIPO):
WO2015158828A1
United States of America:
US9989766B2 US20170045743A1
Michael Patra, Ralf Müller
Illumination system for EUV projection lithography
Filing date: 22 November 2013
Granted: 1 May 2018
China (PRC):
CN105765460A CN110068990A
World Intellectual Property Organisation (WIPO):
WO2015078776A1
Germany:
DE102013223935A1
United States of America:
US10310381B2 US20160252823A1 US20180224750A1 US9958783B2
South Korea:
KR102016088421A KR102021039000A
European patent office:
EP3072015B1 EP3467590A1 EP3072015A1
Michael Patra
Illumination optical unit and illumination system for EUV projection lithography
Filing date: 11 September 2013
Granted: 13 March 2018
China (PRC):
CN105706003A
World Intellectual Property Organisation (WIPO):
WO2015036226A1
Germany:
DE102013218131A1
Japan:
JP2020122989A
United States of America:
US20160187784A1 US9915874B2
South Korea:
KR102016054579A
Martin Endres, Michael Patra
Illumination optical unit
Filing date: 17 July 2012
Granted: 13 February 2018
World Intellectual Property Organisation (WIPO):
WO2014012929A1
Germany:
DE102012212453A1
United States of America:
US9891530B2 US20150092174A1
Michael Patra
System for producing structures in a substrate
Filing date: 16 May 2013
Granted: 30 January 2018
World Intellectual Property Organisation (WIPO):
WO2014184292A1
Germany:
DE102013209093A1
United States of America:
US20160062244A1 US9880474B2
Michael Patra
Illumination optical unit for euv projection lithography
Filing date: 5 April 2016
Granted: 28 December 2017
Taiwan:
TWI625606B TW201802612A
Germany:
DE102016205624B4 DE102016205624A1
China (PRC):
CN107272345A
Michael Patra
Illumination system for an EUV projection lithographic projection exposure apparatus
Filing date: 8 August 2012
Granted: 26 December 2017
World Intellectual Property Organisation (WIPO):
WO2014023660A1
Germany:
DE102012214063A1
European patent office:
EP2883112A1
United States of America:
US9851641B2 US20150124233A1
China (PRC):
CN104541207A
Michael Patra
Illumination optical unit for EUV projection lithography
Filing date: 11 September 2013
Granted: 12 December 2017
World Intellectual Property Organisation (WIPO):
WO2015036225A1
South Korea:
KR102016054585A
Germany:
DE102013218130A1
United States of America:
US20160187786A1 US9841683B2
Michael Patra
Euv light source for a lighting device of a microlithographic projection exposure apparatus
Filing date: 26 March 2014
Granted: 21 November 2017
China (PRC):
CN106133609A
World Intellectual Property Organisation (WIPO):
WO2015144386A1
Germany:
DE102014205579A1
United States of America:
US20170003597A1 US9823571B2
South Korea:
KR102016136427A
European patent office:
EP3123246A1 EP3123246B1
Michael Patra, Stig Bieling, Markus Degünther, Johannes Wangler
Assembly for a projection exposure apparatus for EUV projection lithography
Filing date: 11 May 2012
Granted: 17 October 2017
World Intellectual Property Organisation (WIPO):
WO2013167409A1
Germany:
DE102012207866A1
United States of America:
US20150062549A1 US9791784B2
Michael Patra
Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical system
Filing date: 13 November 2012
Granted: 17 October 2017
World Intellectual Property Organisation (WIPO):
WO2014075917A1
Germany:
DE102012220596A1
United States of America:
US9791785B2 US20150198891A1
Günter Rudolph, Hans-Jürgen Dobschal, Momchil Davidkov, Eduard Schmidt, Michael Patra
Spectacle lens for a display device which can be placed on the head of a user and generates an image, and a display device with such a spectacle lens
Filing date: 21 June 2016
Granted: 28 September 2017
World Intellectual Property Organisation (WIPO):
WO2017220474A1
Germany:
DE102016111341B3
Axel Scholz, Michael Patra, Frank Schlesener, Manfred Maul, Wolfgang Emer, Stefanie Hilt
Illumination optical unit for projection lithography
Filing date: 10 July 2013
Granted: 5 September 2017
South Korea:
KR102015007264A
Germany:
DE102013213545A1
Japan:
JP2015038975A
European patent office:
EP2824512A2 EP2824512A3 EP2824512B1
United States of America:
US20150015862A1 US9753375B2
Michael Patra, Markus Degünther
Illumination optics for extreme UV projection lithography to guide illuminating light to lighting field, has channel guiding light sub beams, where difference between run times of sub beams is greater than coherence duration of light
Filing date: 9 March 2012
Granted: 9 May 2017
China (PRC):
CN104246617A
World Intellectual Property Organisation (WIPO):
WO2013131834A1
Germany:
DE102012203716A1 DE102012218076A1
United States of America:
US20140368803A1 US9645501B2
South Korea:
KR102014141647A
European patent office:
EP2823360A1
Michael Patra
Method of operating a microlithographic apparatus
Filing date: 8 October 2012
Granted: 4 April 2017
World Intellectual Property Organisation (WIPO):
WO2014056512A1
South Korea:
KR102015064062A
United States of America:
US9612540B2 US20150168849A1
Michael Patra
Method for designing an illumination optics and illumination optics
Filing date: 25 June 2012
Granted: 1 April 2017
World Intellectual Property Organisation (WIPO):
WO2014000763A1
Taiwan:
TW201405169A TWI576613B
Frank Schlesener, Ingo Sänger, Olaf Dittmann, Akxel Göhnermeier, Alexandra Pazidis, Thomas Schicketanz, Michael Patra, Markus Degünther
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
Filing date: 23 June 2015
Granted: 28 February 2017
United States of America: US9581910B2 US20150301455A1
Johannes Wangler, Johannes Eisenmenger, Markus Degünther, Michael Patra
Monitor system for determining orientations of mirror elements and EUV lithography system
Filing date: 5 October 2012
Granted: 7 February 2017
World Intellectual Property Organisation (WIPO):
WO2014053248A1
Germany:
DE102012218221A1
European patent office:
EP2904454A1 EP2904454B1
United States of America:
US9563129B2 US20150198894A1
China (PRC):
CN104769501A
Michael Patra, Markus Degünther
Facet mirror for a projection exposure apparatus
Filing date: 23 September 2013
Granted: 21 December 2016
World Intellectual Property Organisation (WIPO):
WO2015040160A1
Taiwan:
TWI563347B TW201527893A
Germany:
DE102013219057A1
United States of America:
US9823577B2 US20160170308A1
Michael Patra, Markus Degünther
Mask for microlithography and scanning projection exposure method utilizing the mask
Filing date: 28 December 2011
Granted: 23 August 2016
World Intellectual Property Organisation (WIPO):
WO2013097897A1
China (PRC):
CN104136998A
United States of America:
US9423686B2 US20140377692A1
European patent office:
EP2798402A1 EP2798402B1
Michael Patra, Markus Degünther, Michael Layh
Illumination optical system for microlithography and projection exposure system with an illumination optical system of this type
Filing date: 15 June 2010
Granted: 21 June 2016
World Intellectual Property Organisation (WIPO):
WO2011157601A2 WO2011157601A3
Taiwan:
TW201219987A TWI539240B
Germany:
DE102010030089A1
European patent office:
EP2583141B1 EP2583141A2
United States of America:
US20130077076A1 US9933704B2
Michael Patra
Illumination system of a microlithographic projection exposure apparatus
Filing date: 27 October 2012
Granted: 1 May 2016
World Intellectual Property Organisation (WIPO):
WO2014063719A1
Taiwan:
TW201423284A TWI531871B
China (PRC):
CN104718499A
United States of America:
US20150185622A1 US9671699B2
South Korea:
KR102015053995A
Michael Patra
Illumination system of a microlithographic projection exposure apparatus
Filing date: 8 October 2012
Granted: 16 February 2016
World Intellectual Property Organisation (WIPO):
WO2014056513A1
Taiwan:
TW201423282A TWI536122B
United States of America:
US9261695B2 US20150070671A1
South Korea:
KR102014080457A
Michael Patra, Markus Schwab
Illumination system of a microlithographic projection exposure apparatus
Filing date: 30 August 2010
Granted: 15 December 2015
China (PRC):
CN103097955A
World Intellectual Property Organisation (WIPO):
WO2012028158A1
Taiwan:
TW201222161A TWI544282B
United States of America:
US9213244B2 US9678438B2 US20130114060A1 US20160070176A1
South Korea:
KR102013060281A
European patent office:
EP2649493A1
Michael Patra
EUV light source
Filing date: 23 July 2012
Granted: 13 October 2015
World Intellectual Property Organisation (WIPO):
WO2014016139A1
Germany:
DE102012212830A1
United States of America:
US20150137012A1 US9161426B2
Michael Patra, Markus Degünther
Illumination system of a microlithographic projection exposure apparatus
Filing date: 28 February 2011
Granted: 1 October 2015
World Intellectual Property Organisation (WIPO):
WO2012116710A1
Taiwan:
TW201248335A TWI502285B
United States of America:
US20130308115A1 US9280055B2
South Korea:
KR102014021549A
Michael Patra
Illumination optical unit for EUV projection lithography
Filing date: 19 March 2012
Granted: 13 August 2015
World Intellectual Property Organisation (WIPO):
WO2013139635A1
Germany:
DE102012204273A1 DE102012204273B4
Japan:
JP2018101150A
United States of America:
US9612537B2 US20140362361A1 US20160154316A1 US9280061B2
Michael Patra
Illumination optical unit for projection lithography
Filing date: 25 May 2011
Granted: 13 August 2015
World Intellectual Property Organisation (WIPO):
WO2012160061A1
Taiwan:
TW201303525A
Germany:
DE102011076436A1 DE102011076436B4
Michael Patra, Johannes Eisenmenger, Markus Schwab
Optical system for a microlithographic projection exposure apparatus
Filing date: 24 July 2013
Granted: 16 July 2015
Germany:
DE102013214459A1 DE102013214459B4
Japan:
JP2015043418A
European patent office:
EP2829917B1 EP2829917A1
United States of America:
US20150029477A1 US9535331B2
Michael Patra, Stig Bieling, Markus Degünther, Frank Schlesener, Markus Schwab
Illumination system of a microlithographic projection exposure apparatus
Filing date: 28 December 2010
Granted: 22 April 2015
World Intellectual Property Organisation (WIPO):
WO2012089224A1
Taiwan:
TWI557515B TW201241576A
China (PRC):
CN102859440A CN102859440B
United States of America:
US9983483B2 US9477157B2 US20130057844A1 US20170038691A1 US9046786B2 US20150234291A1
South Korea:
KR102013012138A
Michael Patra
Illumination optic unit for use in lithographic projection exposure system, has pupil facets applied with actual illumination intensity if intensity equals to zero during location of facets outside pupil region and edge section
Filing date: 17 June 2013
Granted: 20 November 2014
Germany: DE102013211268A1 DE102013211268B4
Markus Degünther, Michael Patra, András Major
Microlithographic projection exposure apparatus
Filing date: 13 March 2009
Granted: 7 October 2014
World Intellectual Property Organisation (WIPO):
WO2010102649A1
Taiwan:
TWI497221B TW201100971A
China (PRC):
CN102349026A
United States of America:
US20120002185A1 US8854604B2
Michael Patra
Method for setting an illumination geometry for an illumination optical unit for EUV projection lithography
Filing date: 30 January 2012
Granted: 20 August 2013
South Korea:
KR102013088071A
Germany:
DE102012201235B4 DE102012201235A1
United States of America:
US20130194559A1 US8514372B1
Michael Patra
Microlithographic projection exposure apparatus and method of measuring a parameter related to an optical surface contained therein
Filing date: 17 July 2009
Granted: 5 June 2013
World Intellectual Property Organisation (WIPO):
WO2011006522A1
South Korea:
KR102012037995A
European patent office:
EP2454636B1 EP2454636A1
United States of America:
US8593645B2 US20120105865A1
China (PRC):
CN102472974A CN102472974B
Michael Layh, Markus Degünther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka, Gundula Weiß
Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
Filing date: 12 December 2008
Granted: 1 May 2013
China (PRC):
CN101946212B CN101946212A CN103558738A
World Intellectual Property Organisation (WIPO):
WO2009080279A1
Taiwan:
TWI450049B TW200935187A
Germany:
DE102008054582A1
United States of America:
US20150177623A1 US8891057B2 US20100283984A1 US20100283985A1 US10146135B2 US8724086B2 US20140211188A1
South Korea:
KR102015082662A KR102010107014A
European patent office:
EP2238515A1 EP2238515B1
Michael Patra
Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source
Filing date: 17 February 2009
Granted: 23 January 2013
China (PRC):
CN102317868B CN102317868A
World Intellectual Property Organisation (WIPO):
WO2010094399A1
Germany:
DE102009010560A1
United States of America:
US20110304837A1 US8896816B2
South Korea:
KR102011126705A
European patent office:
EP2399170A1 EP2399170B1
Michael Patra
Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus
Filing date: 9 February 2010
Granted: 2 January 2013
South Korea:
KR102011093663A
Japan:
JP2011166158A
European patent office:
EP2354853B1 EP2354853A1
United States of America:
US20110194090A1 US8724080B2
Stefan Xalter, Yim-Bun Patrick Kwan, András Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Degünther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
Filing date: 6 February 2008
Granted: 29 August 2012
China (PRC):
CN103345128A CN101636696B CN101636696A
World Intellectual Property Organisation (WIPO):
WO2008095695A2 WO2008095695A3
Taiwan:
TW200900673A TWI444606B
Germany:
DE102008040742A1
United States of America:
US20180246415A1 US20120293784A1 US20150300807A1 US9239229B2 US9897925B2 US9013684B2 US9019475B2 US20160266502A1 US20140226141A1 US20100039629A1 US9001309B2 US8339577B2
South Korea:
KR102014054461A KR102009116731A
European patent office:
EP2115535B9 EP2115535B1 EP2511765A3 EP2511765A2 EP2115535A2 EP2511765B1
Michael Patra, Martin Meier
Polarization actuator
Filing date: 26 October 2010
Granted: 5 April 2012
South Korea:
KR102012043650A
Germany:
DE102010042901B3
Japan:
JP2012104813A
United States of America:
US8373847B2 US20120099093A1
Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Degünther, Michael Layh
Illumination system for illuminating a mask in a microlithographic exposure apparatus
Filing date: 13 December 2008
Granted: 2 November 2011
World Intellectual Property Organisation (WIPO):
WO2009080231A1
European patent office:
EP2388649B1 EP2238513B1 EP2238513A1 EP2388650A1 EP2388649A1 EP2388650B1
United States of America:
US9977333B2 US20180335702A1 US8467031B2 US20130250264A1 US9310694B2 US20170351183A1 US20160187789A1 US9599904B2 US10191382B2 US20100265482A1
Austria:
AT532105E
Thomas Fischer, Hubert Holderer, Michael Patra, Lars Wischmeier
Measurement illumination optics for guiding illumination light into an object field of a projection exposure system for EUV lithography
Filing date: 23 June 2020
Germany: DE102020207785A1
Thomas Fischer, Hubert Holderer, Michael Patra, Lars Wischmeier
Measuring illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography
Filing date: 28 April 2020
World Intellectual Property Organisation (WIPO):
WO2020221763A1
Germany:
DE102020208416A1
Michael Patra, Hans-Jürgen Rostalski
Surface profile measuring device for measuring the mirror of an imaging optic
Filing date: 10 December 2019
Germany: DE102019219209A1
Erik Loopstra, Michael Patra, Michael Totzeck
MANUFACTURING DEVICE FOR MANUFACTURING ADDITIVES AND METHOD FOR MANUFACTURING ADDITIVES
Filing date: 22 November 2019
Germany: DE102019131635A1
Michael Patra
Optical illumination system for guiding EUV radiation
Filing date: 9 August 2019
World Intellectual Property Organisation (WIPO):
WO2021028132A1
Germany:
DE102019212017A1
Michael Patra
Projection exposure apparatus for semiconductor lithography and method for assembling a projection exposure apparatus
Filing date: 23 July 2019
Germany: DE102019210896A1
Michael Patra
Radiation source module
Filing date: 13 May 2019
Germany: DE102019206869A1 DE102020201368A1
Sascha Migura, Michael Patra
Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such an imaging optical unit
Filing date: 11 April 2019
World Intellectual Property Organisation (WIPO):
WO2020207768A1 WO2020207768A8
Taiwan:
TW202043839A
Germany:
DE102019205271A1
Susanne Beder, Michael Patra, Hans-Jürgen Rostalski, Johannes Ruoff, Alexander Wolf
Imaging optics for imaging an object field in an image field and projection exposure apparatus with such an imaging optics
Filing date: 28 February 2019
Germany: DE102019202759A1
Valentin Jonatan Bolsinger, Christof Jalics, Holger Kierey, Wolfgang Merkel, Jonas Metz, Michael Patra, Fabian Schuster, Ingrid Schuster, Ulrich Vogl
EUV collector for use in an EUV projection exposure system
Filing date: 21 January 2019
Germany: DE102019200698A1
Michael Patra
Projection optics for a projection exposure machine
Filing date: 12 September 2018
Germany: DE102018215505A1
Michael Patra, Thomas Schicketanz
Optical arrangement and EUV lithography device with it
Filing date: 28 August 2018
Germany: DE102018214559A1
Michael Patra, Markus Schwab
Pupil facet mirror
Filing date: 23 August 2018
Germany: DE102018214223A1
Michael Patra
Stop for arrangement in a constriction of an EUV illumination beam
Filing date: 4 June 2018
World Intellectual Property Organisation (WIPO):
WO2019233741A1
South Korea:
KR102021018347A
Germany:
DE102018208710A1
European patent office:
EP3803512A1
United States of America:
US20210084741A1
Michael Patra
Facet mirror for an illumination optical unit for projection lithography
Filing date: 14 May 2018
South Korea:
KR102019130498A
Germany:
DE102018207410A1
Martin Endres, Michael Patra
mirror
Filing date: 8 May 2018
Germany: DE102018219860A1 DE102018207107A1
Johannes Eisenmenger, Thomas Fischer, Martin Meier, Michael Patra, Johannes Zellner
Field facet mirror
Filing date: 8 May 2018
Germany: DE102018207103A1
DAVYDENKO VLADIMIR, DE, Jan Horn, Michael Patra, ZOTT ANDY, DE
Apparatus and method for determining a distance of a moving object
Filing date: 5 February 2018
World Intellectual Property Organisation (WIPO):
WO2019149725A1
Germany:
DE102018201735A1
Michael Patra
Spatial light modulator and method for producing microstructured components
Filing date: 1 February 2018
Germany: DE102018201532A1
Michael Patra
EUV LIGHTING SYSTEM AND METHOD FOR PRODUCING A LIGHTING RADIATION
Filing date: 29 November 2017
Germany: DE102017221420A1
Michael Patra
Illumination system of a microlithographic projection exposure apparatus
Filing date: 30 June 2017
Japan: JP2017182094A
Michael Patra
Assembly, in particular in a microlithographic projection exposure apparatus
Filing date: 19 June 2017
Germany: DE102017210206A1
Michael Patra, Stig Bieling
Microlithographic projection exposure machine
Filing date: 30 January 2017
Germany: DE102017201373A1
Michael Patra
Microlithographic projection exposure machine
Filing date: 2 May 2016
Germany: DE102016207487A1
Michael Patra
Illumination optics for a projection exposure machine
Filing date: 23 February 2016
Germany: DE102016202736A1
Michael Patra
Optical component
Filing date: 27 October 2015
Germany: DE102015220955A1 DE102016211732A1
Michael Patra
Spectacle lens for imaging optics for generating a virtual image and data glasses
Filing date: 15 October 2015
Germany: DE102015117557A1
Michael Patra
Spectacle lens for a display device which can be placed on the head of a user
Filing date: 9 September 2015
Germany: DE102015115144A1
Michael Patra
Optical system
Filing date: 10 August 2015
World Intellectual Property Organisation (WIPO):
WO2017025376A1
Germany:
DE102015215216A1
Michael Patra
Method for controlling a beam guiding device, and beam guiding device
Filing date: 9 July 2015
World Intellectual Property Organisation (WIPO):
WO2017005912A2 WO2017005912A3
South Korea:
KR102018028487A
Germany:
DE102015212878A1
China (PRC):
CN107924143A
Michael Patra
Optical system of a microlithographic projection exposure apparatus
Filing date: 1 June 2015
World Intellectual Property Organisation (WIPO):
WO2016192959A1
South Korea:
KR102018013933A
Germany:
DE102015210041A1
China (PRC):
CN107810445A
Michael Patra
Method and device for data projection
Filing date: 7 April 2015
World Intellectual Property Organisation (WIPO):
WO2016162187A1
Germany:
DE102015105250A1
Michael Patra
Device for data reflection
Filing date: 7 April 2015
World Intellectual Property Organisation (WIPO):
WO2016162167A1
Germany:
DE102015105233A1
Michael Patra
Method and device for cooling a component of a projection exposure apparatus
Filing date: 12 January 2015
Germany: DE102015200281A1
Michael Patra
Radiation source module
Filing date: 17 October 2014
World Intellectual Property Organisation (WIPO):
WO2016058826A1
Taiwan:
TW201624145A
Germany:
DE102014221173A1
Michael Patra, Stig Bieling, Markus Degünther, Ralf Müller
Illumination optical unit for a projection exposure system
Filing date: 17 October 2014
World Intellectual Property Organisation (WIPO):
WO2016058851A1
Taiwan:
TW201616245A
Germany:
DE102014221175A1
China (PRC):
CN106716254A
South Korea:
KR102017074868A
Michael Patra, Bernhard Sitek
Arrangement of an energy sensor device
Filing date: 29 September 2014
Germany: DE102014219649A1
Michael Patra
Method for assigning a second facet of a second faceted element of an illumination optical system in the beam path
Filing date: 3 September 2014
Germany: DE102014217608A1
Michael Patra
Extreme UV lithography system used for performing miniaturization of e.g. semiconductor wafers, has electron switch that is arranged between accelerator unit and undulator unit, for directing electron beam alternately to undulators
Filing date: 21 June 2013
Germany: DE102013211830A1
Michael Patra
Method for illuminating a picture field
Filing date: 5 March 2013
World Intellectual Property Organisation (WIPO):
WO2014135448A1
Germany:
DE102013203689A1
Michael Patra
Lighting system for microlithographic projection exposure system, has optical element directing light beam on another optical element such that main beam extends from non-zero angle to optical axis of illumination system
Filing date: 5 March 2013
Germany: DE102013203751A1
Frank Schlesener, Ingo Sänger, Olaf Dittmann, Aksel Göhnermeier, Alexandra Pazidis, Thomas Schicketanz, Michael Patra, Markus Degünther
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
Filing date: 17 January 2013
World Intellectual Property Organisation (WIPO): WO2014111098A1
Michael Patra
Illumination device for use in microlithographic projection exposure system, has polarization influencing optical element attached to reflecting side surface so that state of polarization of light beam on beam path is differently influenced
Filing date: 9 August 2012
Germany: DE102012214198A1
Michael Patra
Microlithographic exposure method, and microlithographic projection exposure apparatus
Filing date: 8 August 2012
World Intellectual Property Organisation (WIPO):
WO2014023619A1
Germany:
DE102012214052A1
Michael Patra, Stig Bieling
Mirror exchange array of set structure for illumination optics used in e.g. scanner for performing microlithography, has single mirrors of mirror exchange array unit that are set with high reflecting coating portion
Filing date: 7 August 2012
Germany: DE102012213937A1
Michael Patra, Bernhard Kneer, Jörg Zimmermann
Illumination optical unit for projection exposure system, has pupil facet mirror that is provided such that number of pupil facets in inner group is set different from number of pupil facets in outer group
Filing date: 30 July 2012
Germany: DE102012213368A1
Michael Patra, Markus Degünther
Measuring device for measuring imaging optical system i.e. projection lens, for forming object field in image plane, has detector arranged in front of optical system, and reference mark arranged behind optical system
Filing date: 19 July 2012
Germany: DE102012212662A1
Michael Patra, Stig Bieling, Markus Degünther, Martin Endres, Johannes Wangler, Udo Dinger, Wolfgang Singer
Optical component for use in illumination optics of illumination system of projection exposure system for guiding light radiation to object field, has individual mirrors with front side that forms individual mirror reflecting surface
Filing date: 18 June 2012
Germany: DE102012210174A1
Michael Patra, Manfred Maul, Markus Degünther
Lighting system for extreme ultraviolet-projection lithography in projection exposure apparatus, has optical illumination angel-variation component is provided in beam path of illumination light
Filing date: 15 May 2012
Germany: DE102012208096A1
Michael Patra
Illumination lens for lighting system of scanner to manufacture e.g. memory chips, has optical component for guiding light to field, where lens is formed such that beam tufts are overlaid for coinciding edges of beam tufts in sections
Filing date: 14 May 2012
Germany: DE102012208016A1
Michael Patra
Illumination optics of optical system used in scanner for performing microlithography, has lighting channels whose total intensity in region of optical field is adapted by tilting specific number of individual mirrors to preset value
Filing date: 8 May 2012
Germany: DE102012207572A1
Michael Patra, Johannes Eisenmenger
Facet mirror e.g. field facet mirror, for channel-wise reflection of light radiation in UV micro-lithographic projection exposure system, has displaceable micro mirrors whose facet reflecting surfaces exhibit specific area
Filing date: 7 May 2012
Germany: DE102012207511A1
Michael Patra, Markus Degünther
Method for manufacturing e.g. field faucet mirror of illumination optical device, involves arranging structural element with broken mirror element so that one of defective mirror elements is provided out of range of reflection surfaces
Filing date: 27 April 2012
Germany: DE102012207048A1
Ingo Sänger, Michael Patra, Christoph Hennerkes, Bastian Trauter
Optical system of a microlithographic projection exposure apparatus, and method for adjusting an optical system
Filing date: 16 April 2012
World Intellectual Property Organisation (WIPO):
WO2013156251A1
Germany:
DE102012206148A1
Michael Patra, Martin Endres, Markus Degünther, Johannes Wangler
Collector for microlithography projection exposure apparatus used during manufacture of micro-or nano-structured component, has movable portion that is moved to adjust spatial extent of radiation in region of intermediate focus
Filing date: 16 March 2012
Germany: DE102012204142A1
Michael Patra
Filter i.e. dead mirror blocking filter, for filtering certain proportions of work light of light beam assembly, has fields arranged next to each other, and lattice arrangement defining and surrounding fields and formed in irregular manner
Filing date: 8 November 2011
Germany: DE102011085949A1
Michael Patra
Microlithographic projection exposure system i.e. vacuum projection exposure system, operating method, involves changing bandwidth of projection light produced by light sources of system while exposing regions on photosensitive layer
Filing date: 12 August 2011
Germany: DE102011080919A1
Michael Patra
Illumination device for use in micro-lithographic projection lighting system for illuminating reticule, has depolarizer arranged around rotational axis and partially causing effective depolarization of linearly polarized light
Filing date: 8 August 2011
Germany: DE102011080614A1
Michael Patra
Micro-lithographic projection exposure system for manufacturing e.g. integrated switching circuits, has optical arrangement configured in such manner that modification of maximum value is minimized in comparison with analog system
Filing date: 21 July 2011
Germany: DE102011079548A1
Michael Patra
Illumination lens for use in projection illumination system for extreme UV-projection lithography for manufacturing e.g. semiconductor chip, has first selection facet comprising larger surface than surfaces of second and third facets
Filing date: 30 May 2011
Germany: DE102011076658A1
Michael Patra
Illumination device for use in microlithographic projection exposure system for illuminating mask i.e. reticle, for manufacturing e.g. LCD, has optical element arranged between mirror assembly and pupil plane of illumination device
Filing date: 25 May 2011
Germany: DE102011076434A1
Michael Patra, Markus Degünther, Andreas Dorsel
Method for exposing photosensitive layer for projection exposure system, involves supplementary-exposing photosensitive layer with supplementary exposure radiation with wavelength for producing intensity distribution on photosensitive layer
Filing date: 28 March 2011
Germany: DE102011006189A1
Michael Patra
Method for operating lighting device of microlithographic projection exposure system utilized for manufacturing e.g. LCD, involves carrying out illumination of area of optical element with short duration than illumination of another area
Filing date: 14 March 2011
Germany: DE102011005483A1
Markus Schwab, Michael Patra
Illumination system of a microlithographic projection exposure apparatus
Filing date: 14 September 2010
World Intellectual Property Organisation (WIPO):
WO2012034571A1
Taiwan:
TW201234120A
Michael Patra, Olaf Dittmann, Marc Kirch, Martin Endres, Markus Walter, Stig Bieling, Sebastian Dörn
Illumination optical system for EUV projection lithography
Filing date: 8 June 2010
World Intellectual Property Organisation (WIPO):
WO2011154244A1
Taiwan:
TW201214064A
Germany:
DE102010029765A1
Michael Patra, Markus Schwab
Honeycomb condenser, in particular for a microlithographic projection exposure apparatus
Filing date: 14 July 2009
World Intellectual Property Organisation (WIPO):
WO2011006710A3 WO2011006710A2
Germany:
DE102009032939A1
Michael Patra, Markus Degünther, Michael Layh, Johannes Wangler, Manfred Maul
Illumination optics for use in microlithography projection illumination system, has place and time-dissolved detection device arranged such that device detects light intensity distribution based on light intensity distribution in plane
Filing date: 19 November 2007
World Intellectual Property Organisation (WIPO):
WO2008061681A3 WO2008061681A2
Germany:
DE102007055408A1
United States of America:
US20090262324A1